Releases: weiwei-lin/fieldmask-rs
Releases · weiwei-lin/fieldmask-rs
v0.0.6 Release
v0.0.6 is a complete rewrite of fieldmask-rs
Notable changes:
- Split
FieldMask::apply
into two methods:SelfMaskable::project
andSelfMaskable::update
. - The field mask behaviour now follows the official field mask protobuf specification and the official Java implementation.
SelfMaskable
andOptionMaskable
need to be derived explicitly now (instead of as part of theMaskable
derive).- A unit enum can choose to derive either
SelfMaskable
orOptionMaskable
.
- A unit enum can choose to derive either